Factors influencing the properties of fluoropolymer-based resists for 157-nm lithography
- Author(s):
Taylor, G.N. ( Shipley Co. LLC (USA) ) Xu, C.B. Teng, G. Leonard, J. Szmanda, C.R. Lawrence, W. Nur, S. Brown, K.W. Stephen, A. - Publication title:
- Advances in Resist Technology and Processing XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4690
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 51
- Page(to):
- 57
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444363 [0819444367]
- Language:
- English
- Call no.:
- P63600/4690
- Type:
- Conference Proceedings
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