Rigorous electromagnetic simulation of stepper alignment
- Author(s):
- Pistor, T.V. ( Panoramic Technology Inc. (USA) )
- Socha, R.J. ( ASML (USA) )
- Publication title:
- Metrology, Inspection, and Process Control for Microlithography XVI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4689
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 1045
- Page(to):
- 1056
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444356 [0819444359]
- Language:
- English
- Call no.:
- P63600/4689
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Rigorous 3D simulation of phase defects in alternating phase-shifting masks
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Accuracy issues in the finite difference time domain simulation of photomask scattering
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Implementation of pattern-specific illumination pupil optimization on Step & Scan systems
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
Electric-field enhancement by nodular defects in multilayer coatings irradiated at normal and 45° incidence
SPIE - The International Society of Optical Engineering |