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New clear-out scheme to improve the overlay performance for a CMP process

Author(s):
Guo, Y.-W. ( Vanguard International Semiconductor Corp. (Taiwan) )
Kao, H.-P.
Chien, T.-C.
Chang, C.-F.
Lin, H.-S.
Chen, Y.-F.
Ku, C.-Y.
2 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4689
Pub. Year:
2002
Vol.:
Part Two
Page(from):
1037
Page(to):
1044
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444356 [0819444359]
Language:
English
Call no.:
P63600/4689
Type:
Conference Proceedings

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