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Understanding the forbidden pitch phenomenon and assist feature placement

Author(s):
Shi, X. ( ASML MaskTools, Inc. (USA) )
Hsu, S.
Chen, J.F.
Hsu, M.
Socha, R.J. ( ASML (USA) )
Dusa, M.V.
1 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4689
Pub. Year:
2002
Vol.:
Part Two
Page(from):
985
Page(to):
996
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444356 [0819444359]
Language:
English
Call no.:
P63600/4689
Type:
Conference Proceedings

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