Environmental control for lithography with 157-nm exposure
- Author(s):
Kitano, J. ( Tokyo Electron Ltd. (Japan) ) Kiba, Y. ( Tokyo Electron Kyushu Ltd. (Japan) ) Inazawa, K. ( Tokyo ElectronAT Ltd. (Japan) ) Miyoshi, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Watanabe, H. Furukawa, T. Itani, T. - Publication title:
- Metrology, Inspection, and Process Control for Microlithography XVI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4689
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 904
- Page(to):
- 910
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444356 [0819444359]
- Language:
- English
- Call no.:
- P63600/4689
- Type:
- Conference Proceedings
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