Reducing CD-SEM measurement carryover effect for 193-nm resist processes using CEq
- Author(s):
- Zhou, H. ( Texas Instruments Inc. (USA) )
- Wang, C.-Y. ( KLA-Tencor Corp. (USA) )
- Zuo, A.
- Pratt, J.P.
- Publication title:
- Metrology, Inspection, and Process Control for Microlithography XVI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4689
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 742
- Page(to):
- 746
- Pages:
- 5
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444356 [0819444359]
- Language:
- English
- Call no.:
- P63600/4689
- Type:
- Conference Proceedings
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