Atomic force microscopy for phase metrology of alternating-aperture phase-shift masks
- Author(s):
- Miller, K. ( Veeco Metrology Group (USA) )
- Todd, B.
- Pinkerton, T. ( Intel Corp. (USA) )
- Publication title:
- Metrology, Inspection, and Process Control for Microlithography XVI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4689
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 466
- Page(to):
- 472
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444356 [0819444359]
- Language:
- English
- Call no.:
- P63600/4689
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Automated atomic force metrology applications for alternating aperture phase-shift masks
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Atomic force metrology and 3D modeling of microtrenching in etched photomask features
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Electrical dimension characterization of binary and alternating aperture phase-shifting masks
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Atomic force metrology and 3D modeling of microtrenching in etched photomask features
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Evalution of 193-nm alternating-aperture phase-shift mask dry etch processes
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
5
Conference Proceedings
Image performance and mask characterization of 157-nm alternating phase-shifting mask
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Nanoscale dimensional focused ion beam repair of quartz defects on 90-nm node alternating aperture phase shift masks
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |