New developments in excimer laser metrology at 157 nm

New developments in excimer laser metrology at 157 nm

Author(s):

Dowell, M.L. ( National Institute of Standards and Technology (USA) )
Jones, R.D.
Laabs, H.
Cromer, C.L.
Morton, R.D. ( International SEMATECH (USA) )

Publication title:

Metrology, Inspection, and Process Control for Microlithography XVI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4689

Pub. Year:

2002

Vol.:

Part One

Page(from):

63

Page(to):

69

Pages:

7

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444356 [0819444359]

Language:

English

Call no.:

P63600/4689

Type:

Conference Proceedings

Details

TDL ID:	ZA00012521
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, inspection, and process control for microlithography
Conf. info. (Number):	2002 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.04-2002.03.07

Similar Items:

1 Conference Proceedings Damage testing of partial reflectors for 157-nm laser calorimeters Laabs, H., Jones, R.D., Cromer, C.L., Dowell, M.L., Liberman, V. SPIE-The International Society for Optical Engineering	7 Conference Proceedings New dimensions of micromachining with 157-nm laser light Kauf,M., Endert,H., Fair,J., Paetzel,R., Scaggs,M.J., Basting,D. SPIE - The International Society for Optical Engineering
2 Technical Paper New Developments in Deep Ultraviolet Laser Metrology for Photolithography. Dowell, M.L., Cromer, C.L., Jones, R.D., Keenan, D.A., Scott, T.R. Society of Manufacturing Engineers	8 Conference Proceedings Excimer laser for 157-nm lithography Stamm,U., Bragin,I., Govorkov,S.V., Kleinschmidt,J., Patzel,R., Slobodtchikov,E., Vogler,K., F.Voｦﾂ, Basting,D. SPIE - The International Society for Optical Engineering
3 Technical Paper Thermal Modeling of Calorimeters for Excimer Lasers at 193 nm Wavelength Chen, D.H., Dowell, M.L., Cromer, C.L., Zhang, Z.M. American Institute of Aeronautics and Astronautics	9 Conference Proceedings Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography French,R.H., Gordon,J.S., Jones,D.J., Lemon,M.F., Wheland,R.C., Zhang,E., Zumsteg Jr.,F.C., Sharp,K.G., Qiu,W. SPIE-The International Society for Optical Engineering
4 Conference Proceedings 193-nm detector nonlinearity measurement system at NIST Yang, S., Keenan, D.A., Laabs, H., Dowell, M.L. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Surface-emitting laser diode beam characterization Jones,R.D., Obarski,G.E., Livigni,D.J., Laabs,H. SPIE-The International Society for Optical Engineering
5 Technical Paper THERMAL RESPONSE AND INEQUIVALENCE OF PULSED ULTRAVIOLET-LASER CALORIMETERS Chen,D.H., Dowell,M.L., Cromer,C.L., Zhang,Z.M. American Institute of Aeronautics and Astronautics	11 Conference Proceedings Development of pellicle for F2(157-nm) excimer laser Shigematsu, S., Nakano, T., Shigemoto, H., Kondo, M., Nakagawa, H., Sasaki, H., Higashikawa, I. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Characterization of new aromatic polymers for 157-nm photoresist applications Fender,N., Brock,P.J., Chau,W., Bangsaruntip,S., Mahorowala,A.P., Wallraff,G.M., Hinsberg,W.D., Larson,C.E., Ito,H., … SPIE-The International Society for Optical Engineering	12 Conference Proceedings New materials for 157-nm photoresists characterization and properties Crawford,M.K., Feiring,A.E., Feldman,J., French,R.H., Periyasamy,M.P., III,F.L.Schadt, Smalley,R.J., Zurnsteg,F.C., … SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12