Cost of ownership analysis for patterning using step and flash imprint lithography
- Author(s):
- Sreenivasan, S.V. ( Univ. of Texas at Austin (USA) )
- Willson, C.G.
- Schumaker, N.E. ( Molecular Imprints, Inc. (USA) )
- Resnick, D.J. ( Motorola (USA) )
- Publication title:
- Emerging Lithographic Technologies VI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4688
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 903
- Page(to):
- 909
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444349 [0819444340]
- Language:
- English
- Call no.:
- P63600/4688
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Development of imprint materials for the Step and Flash Imprint Lithography process
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Step and flash imprint lithography:a new approach to high-resolution patterning
SPIE - The International Society for Optical Engineering |
4
Conference Proceedings
Employing Step-and-Flash imprint lithography for gate-level patterning of a MOSFET device
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
12
Conference Proceedings
Template fabrication for sub-80-nm contact hole patterning using step and flash imprint lithography
SPIE - The International Society of Optical Engineering |