Pattern distortion of the stencil reticle caused by stress of silicon membrane and resist on the reticle

Pattern distortion of the stencil reticle caused by stress of silicon membrane and resist on the reticle

Author(s):

Takahashi, S.-I. ( Nikon Corp. (Japan) )
Okada, M.
Katakura, N.
Irita, T.
Kawata, S.

Publication title:

Emerging Lithographic Technologies VI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4688

Pub. Year:

2002

Vol.:

Part Two

Page(from):

798

Page(to):

806

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444349 [0819444340]

Language:

English

Call no.:

P63600/4688

Type:

Conference Proceedings

Details

TDL ID:	ZA00012520
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging lithographic technologies
Conf. info. (Number):	2002 : 6th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.05-2002.03.07

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