Defect printability analysis on electron projection lithography with diamond stencil reticle
- Author(s):
Tomo, Y. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Kojima, Y. ( Fujitsu Ltd. (Japan) ) Shimizu, S. ( Nikon Corp. (Japan) ) Watanabe, M. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Takenaka, H. Yamashita, H. Iwasaki, T. Takahashi, K. Yamabe, M. - Publication title:
- Emerging Lithographic Technologies VI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4688
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 786
- Page(to):
- 797
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444349 [0819444340]
- Language:
- English
- Call no.:
- P63600/4688
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Shot number analysis on character projection e-beam lithography for random logic device fabrication at 70-nm node
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |