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Fine pattern replication on 10×10-mm exposure area using ETS-1 laboratory tool in HIT

Author(s):
Hamamoto, K. ( Himeji Institute of Technology (Japan) )
Watanabe, T.
Hada, H. ( Tokyo Ohka Kogyo Co., Ltd. (Japan) )
Komano, H.
Kishimura, S. ( Matsushita Electric Industrial Co., Ltd. (Japan) )
Okazaki, S. ( Association of Super-Advanced Electronics Technologies (Japan) )
Kinoshita, H. ( Himeji Institute of Technology (Japan) )
2 more
Publication title:
Emerging Lithographic Technologies VI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4688
Pub. Year:
2002
Vol.:
Part Two
Page(from):
664
Page(to):
671
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444349 [0819444340]
Language:
English
Call no.:
P63600/4688
Type:
Conference Proceedings

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