Thermal expansion behavior of proposed EUVL substrate materials
- Author(s):
Mitra, I. ( Schott Glas (Germany) ) Davis, M.J. ( Schott Glass Technologies (USA) ) Alkemper, J. ( Schott Glas (Germany) ) Mueller, R. Kohlmann, H. Aschke, L. ( Schott Lithotec AG (Germany) ) Moersen, E. Ritter, S. ( Schott Glas (Germany) ) Hack, H. Pannhorst, W. - Publication title:
- Emerging Lithographic Technologies VI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4688
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 462
- Page(to):
- 468
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444349 [0819444340]
- Language:
- English
- Call no.:
- P63600/4688
- Type:
- Conference Proceedings
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