REAP (raster e-beam advanced process) using 50-kV raster e-beam system for sub-100-nm node mask technology

REAP (raster e-beam advanced process) using 50-kV raster e-beam system for sub-100-nm node mask technology

Author(s):

Baik, K.-H. ( Etec Systems ,Inc. (USA) )

Publication title:

Emerging Lithographic Technologies VI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4688

Pub. Year:

2002

Vol.:

Part One

Page(from):

401

Page(to):

411

Pages:

11

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444349 [0819444340]

Language:

English

Call no.:

P63600/4688

Type:

Conference Proceedings

Details

TDL ID:	ZA00012519
Series ID:	PA00000029
Conf. info. (Name):	Emerging lithographic technologies
Conf. info. (Number):	2002 : 6th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.05-2002.03.07

Similar Items:

1 Conference Proceedings Comparative study between REAP 200 and FEP171 CAR with 50-kV raster e-beam system for sub-100-nm technology Baik, K.-H., Lem, H.Y., Dean, R.L., Osborne, S., Mueller, M., Abboud, F.E. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Dry etching of chrome for photomasks for 100-nm technology using chemically amplified resist Mueller, M., Komarov, S., Baik, K.-H. SPIE-The International Society for Optical Engineering
2 Conference Proceedings 100-nm OPC mask patterning using raster-scan 50-kV pattern generation technology Abboud,F.E., Baik,K.-H., Chakarian,V., Cole,D.M., Daniel,J.P., Dean,R.L., Gesley,M.A., Lu,M., Naber,R.J., Newman,T.H., … SPIE-The International Society for Optical Engineering	8 Conference Proceedings Electron-beam proximity effect correction on the MEBES eXara mask pattern generator Dean, R.L., Baik, K.-H. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Raster scan patterning solution for 100-and 70-nm OPC masks Abboud, F.E., Baik, K.-H., Chakarian, V., Cole, D. M., Dean, R.L., Gesley M.A., Gillman. H., Moore, W.C., Mueller, M., … SPIE-The International Society for Optical Engineering	9 Conference Proceedings PBS resist profile studies for submicron mask lithography R.L. Dean, H.Y. Lem, C. Sauer, H. Chang Society of Photo-optical Instrumentation Engineers
4 Conference Proceedings Comparative study of two negative CAR resists: EN-024M and NEB 31 Baik, K.-H., Dean, R., Lem, H.Y., Osborne, S.P., Mueller, M.A., Cole, D.M. SPIE - The International Society of Optical Engineering	10 Conference Proceedings Improving global CD uniformity by optimizing post-exposure bake and develop sequences Osborne, S.P., Mueller, M., Lem, H., Reyland, D., Baik, K.H. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Further advances in electron-beam pattern generation technology for 180-nm masks Abboud,F.E., Sauer,C.A., Vernon,M., Coleman,T.P., Dean,R.L., Wang,W., Prior,R., Lu,M., Weaver,S. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Advanced mask cleaning techniques for sub-100-nm technology nodes [5992-53] Papanu, J. S., Gouk, R., Franklin, C., Chen, H. -W., Verhaverbeke, S., Ko, A., Child, K., Boelen, P., Shrauti, S., … SPIE - The International Society of Optical Engineering
6 Conference Proceedings Advanced electron-beam pattern generation technology for 180-nm masks Abboud,F.E., Sauer,C.A., Wang,W., Vernon,M., Prior,R., Pearce-Percy,H.T., Cole,D.M., Mankos,M. SPIE-The International Society for Optical Engineering	12 Conference Proceedings High-productivity mask writer with broad operating range Baik,K.-H., Chakarian,V., Dean,B., Lu,M., Naber,R.J., Newman,T.H., Wiltse,M., Abboud,F.E. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12