Status of fabrication of square-format masks for extreme-ultraviolet lithography (EUVL) at the MCoC
- Author(s):
Racette, K.C. ( IBM Microelectronics Div. (USA) ) Williams, C.T. Fisch, E. Kindt, L. Lawliss, M. Ackel, R. Lercel, M.J. - Publication title:
- Emerging Lithographic Technologies VI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4688
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 161
- Page(to):
- 172
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444349 [0819444340]
- Language:
- English
- Call no.:
- P63600/4688
- Type:
- Conference Proceedings
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