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EUVL masks: requirements and potential solutions (Invited Paper)

Author(s):
Hector, S.D. ( Motorola (USA) )  
Publication title:
Emerging Lithographic Technologies VI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4688
Pub. Year:
2002
Vol.:
Part One
Page(from):
134
Page(to):
149
Pages:
16
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444349 [0819444340]
Language:
English
Call no.:
P63600/4688
Type:
Conference Proceedings

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