Performance upgrades in the EUV engineering test stand | 東京工業大学附属図書館文献データベース

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Performance upgrades in the EUV engineering test stand

Author(s):

Tichenor, D.A. ( Sandia National Labs. (USA) )

Lee, S.H. ( Intel Corp. (USA) )

Ballard, W.P. ( Sandia National Labs. (USA) )

Klebanoff, L.E.

Goldsmith, J.E.M.

Jefferson, K.L.

Shields, H. ( TRW, Inc. (USA) )

Hale, L.C. ( Lawrence Livermore National Lab. (USA) )

Sommargren, G.E.

Goldberg, K.A. ( Lawrence Berkeley National Lab. (USA) )

Gullikson, E.M.

Publication title:

Emerging Lithographic Technologies VI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4688

Pub. Year:

2002

Vol.:

Part One

Page(from):

72

Page(to):

86

Pages:

15

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444349 [0819444340]

Language:

English

Call no.:

P63600/4688

Type:

Conference Proceedings

Details

TDL ID:	ZA00012519
Series ID:	PA00000029
Conf. info. (Name):	Emerging lithographic technologies
Conf. info. (Number):	2002 : 6th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.05-2002.03.07

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