Static microfield printing at the Advanced Light Source with the ETS Set-2 optic
- Author(s):
Naulleau, P.P. ( Lawrence Berkeley National Lab. (USA) ) Goldberg, K.A. Anderson, E.H. Attwood, D.T. ( Univ. of California/Berkeley (USA) ) Batson, P.J. ( Lawrence Berkeley National Lab. (USA) ) Bokor, J. ( Lawrence Berkeley National Lab. (USA) ) Denham, P. ( Lawrence Berkeley National Lab. (USA) ) Gullikson, E.M. Harteneck, B.D. Hoef, B. Jackson, K.H. Olynick, D.L. Rekawa, S. Salmassi, F. Blaedel, K. ( Lawrence Livermore National Lab.(USA) ) Chapman, H.N. Hale, L.C. Soufli, R. Spiller, E.A. Sweeney, D.W. Taylor, J.R. Walton, C.C. Ray-Chaudhuri, A.K. ( Sandia National Lab.(USA) ) O'Connell, D.J. Stulen, R.H. Tichenor, D.A. Gwyn, C.W. ( Intel Corp.(USA) ) Yan, P.-Y. - Publication title:
- Emerging Lithographic Technologies VI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4688
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 64
- Page(to):
- 71
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444349 [0819444340]
- Language:
- English
- Call no.:
- P63600/4688
- Type:
- Conference Proceedings
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