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Static microfield printing at the Advanced Light Source with the ETS Set-2 optic

Author(s):
Naulleau, P.P. ( Lawrence Berkeley National Lab. (USA) )
Goldberg, K.A.
Anderson, E.H.
Attwood, D.T. ( Univ. of California/Berkeley (USA) )
Batson, P.J. ( Lawrence Berkeley National Lab. (USA) )
Bokor, J. ( Lawrence Berkeley National Lab. (USA) )
Denham, P. ( Lawrence Berkeley National Lab. (USA) )
Gullikson, E.M.
Harteneck, B.D.
Hoef, B.
Jackson, K.H.
Olynick, D.L.
Rekawa, S.
Salmassi, F.
Blaedel, K. ( Lawrence Livermore National Lab.(USA) )
Chapman, H.N.
Hale, L.C.
Soufli, R.
Spiller, E.A.
Sweeney, D.W.
Taylor, J.R.
Walton, C.C.
Ray-Chaudhuri, A.K. ( Sandia National Lab.(USA) )
O'Connell, D.J.
Stulen, R.H.
Tichenor, D.A.
Gwyn, C.W. ( Intel Corp.(USA) )
Yan, P.-Y.
23 more
Publication title:
Emerging Lithographic Technologies VI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4688
Pub. Year:
2002
Vol.:
Part One
Page(from):
64
Page(to):
71
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444349 [0819444340]
Language:
English
Call no.:
P63600/4688
Type:
Conference Proceedings

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