High-power-gas-discharge- and laser-plasma-based EUV sources | 東京工業大学附属図書館文献データベース

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High-power-gas-discharge- and laser-plasma-based EUV sources

Author(s):

Flohrer, F. ( XTREME technologies GmbH(Germany) )

Kleinschmidt, J.

Publication title:

Gas and Chemical Lasers and Intense Beam Applications III

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4631

Pub. Year:

2002

Page(from):

264

Page(to):

270

Pages:

7

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819443700 [0819443700]

Language:

English

Call no.:

P63600/4631

Type:

Conference Proceedings

Details

TDL ID:	ZA00012459
Series ID:	PA00000029
Conf. info. (Name):	SPIE LASE : Gas and chemical lasers and intense beam applications
Conf. info. (Number):	2002 : 3rd
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2002.01.22-2002.01.24

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