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Submicron BCDMOS process with extended LDMOS safe-operating-area by optimizing body current

Author(s):
Lee, S.K. ( Fairchild Korea Semiconductor Co. )
Choi, Y.C.
Lee, S.H.
Kwon, T.H.
Kim, C.J.
Kang, H.S.
Song, C.S.
2 more
Publication title:
Advances in microelectronic device technology : 7-9 November 2001, Nanjing, China
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4600
Pub. Year:
2001
Page(from):
26
Page(to):
33
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819443397 [0819443395]
Language:
English
Call no.:
P63600/4600
Type:
Conference Proceedings

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