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Characterization of internal stress of silicon oxinitride thin films fabricated by plasma-enhanced chemical vapor deposition: applications in integrated optics

Author(s):
Publication title:
Advanced photonic sensors and applications II : 27-30 November 2001, Singapore
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4596
Pub. Year:
2001
Page(from):
9
Page(to):
15
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819443267 [0819443263]
Language:
English
Call no.:
P63600/4596
Type:
Conference Proceedings

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