Thin film stress control of absorber stack materials for EUVL reticles
- Author(s):
- Wasson,J.R. ( Motorola )
- Convey,D.
- Mangat,P.J.S.
- Bazzarre,F.
- Parobek,L.
- Publication title:
- 21st Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4562
- Pub. Year:
- 2001
- Vol.:
- 4562
- Pt.:
- Two of Two Parts
- Page(from):
- 926
- Page(to):
- 936
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819442901 [0819442909]
- Language:
- English
- Call no.:
- P63600/4562
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Novel design of att-PSM structure for extreme-ultraviolet lithography and enhancement of image contrast during inspection
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
5
Conference Proceedings
Development of phase shift masks for extreme ultraviolet lithography and optical evaluation of phase shift materials
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Characterization of Be-based multilayer masks using x-ray reflectivity and Auger electron spectroscopy
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |