Blank Cover Image

Mask-related distortions of modified fused silica reticles for 157-nm lithography

Author(s):
Mikkelson,A.R. ( Univ. of Wisconsin/Madison )
Abdo,A.Y.
Cotte,E.P.
Sohn,J.
Engelstad,R.L.
Lovell,E.G.
1 more
Publication title:
21st Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4562
Pub. Year:
2001
Vol.:
4562
Pt.:
Two of Two Parts
Page(from):
914
Page(to):
925
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819442901 [0819442909]
Language:
English
Call no.:
P63600/4562
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Predicting thermomechanical distortions of optical reticles for 157-nm technology

Abdo,A.Y., Engelstad,R.L., Beckman,W.A., Mitchell,J.W., Lovell,E.G.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Mechanical distortions in advanced optical reticles

Mikkelson,A.R., Sprague,M.A., Engelstad,R.L., Lovell,F.G., Trost,D.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Mechanical analysis of hard pellicles for 157-nm lithography

Reu,P.L., Mikkelson,A.R., Schlax,M.P., Cotte,E.P., Siewert,L.K., Engelstad,R.L., Lovell,E.G., Dao,G.T., Zheng,J.-F.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Hard pellicle study for 157-nm lithography

Shu, E.Y., Lo, F.-C., Eschbach, F.O., Cotte, E.P., Engelstand, R.L., Lovell, E.G., Okada, K., Kikugawa, S.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Optimization of EUVL reticle thickness for image placement accuracy

Zheng, L., Mikkelson, A.R., Abdo, A.Y., Engelstad, R.L., Lovell, E.G., White, T.J.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Experimental investigation of hard pellicle purge processes

Abdo, A.Y., Nellis, G.F., Diab, A.K., Cotte, E.P., Chalekian, A.J., Engelstad, R.L., Lovell, E.G., Peski, C.V.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Predicting mechanical distortions in x-ray masks

Cotte,E.P., Engelstad,R.L., Lovell,E.G., Brooks,C.J.

SPIE - The International Society for Optical Engineering
10 Conference Proceedings Modeling LEEPL mask fabrication processes

Azkorra, X., Mikkelson, A.R., Engelstad, R.L., Lovell, E.G., Chang, J., Sohn, J., Nataraju, M., Eguchi, H.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Mechanical distortions in advanced photomasks

Mikkelson,A.R., Engelstad,R.L., Lovell,E.G.

SPIE - The International Society for Optical Engineering
11 Conference Proceedings Influence of film stress on advanced optical reticle distortions

Siewert,L.K., Mikkelson,A.R., Engelstad,R.L., Lovell,E.G., Mason,M.E., Mackay,R.S.

SPIE - The International Society for Optical Engineering
6 Conference Proceedings Mechanical distortions in advanced optical reticles

Mikkelson,A.R., Engelstad,R.L., Lovell,E.G., Bloomstein,T.M., Mason,M.E.

SPIE - The International Society for Optical Engineering
12 Conference Proceedings Mechanical modeling of the reticle and chuck for EUV lithography

Martin, C.J., Mikkelson, A.R., Tejeda, R.O., Engelstad, R.L., Lovell, E.G., Blaedel, K.L., Claudet, A.A.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12