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ArF (193-nm) alternating aperture PSM quartz defect repair and printability for 100-nm node

Author(s):
Chen,J.X. ( DuPont Photomasks, Inc. )
Riddick,J.
Lamantia,M.
Zerrade,A.
Henderson,P.K.
Hughes,G.P.
Tabery,C.E.
Phan,K.A.
Spence,C.A.
Winder,A.A.
Stanton,B.A.
Delarosa,E.A.
Maltabes,J.G.
Philbin,C.E.
Vacca,A.
Pomeroy,S.
11 more
Publication title:
21st Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4562
Pub. Year:
2001
Vol.:
4562
Pt.:
Two of Two Parts
Page(from):
786
Page(to):
797
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819442901 [0819442909]
Language:
English
Call no.:
P63600/4562
Type:
Conference Proceedings

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