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Numerical and experimental studies of pellicle-induced photomask distortions

Author(s):
Cotte,E.P. ( Univ. of Wisconsin/Madison )
Engelstad,R.L.
Lovell,E.G.
Shkel,Y.M.
Eschbach,F.O.
Shu,E.Y.
Tanzil,D.
Calhoun,R.M.
3 more
Publication title:
21st Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4562
Pub. Year:
2001
Vol.:
4562
Pt.:
Two of Two Parts
Page(from):
641
Page(to):
651
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819442901 [0819442909]
Language:
English
Call no.:
P63600/4562
Type:
Conference Proceedings

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