Throughput optimization of electron-beam lithography in photomask fabrication regarding acceptable accuracy of critical dimensions
- Author(s):
- Babin,S.V. ( Soft Services )
- Kuzmin,I.Y.
- Publication title:
- 21st Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4562
- Pub. Year:
- 2001
- Vol.:
- 4562
- Pt.:
- Two of Two Parts
- Page(from):
- 545
- Page(to):
- 551
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819442901 [0819442909]
- Language:
- English
- Call no.:
- P63600/4562
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Photomask fabrication of focusing diffractive optical elements using electron-beam lithography
Society of Photo-optical Instrumentation Engineers |
7
Conference Proceedings
Resist heating dependence on subfield scheduling in 50-kV electron beam maskmaking
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Subfield scheduling for throughput maximization in electron-beam photomask fabrication
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Evaluation of the dry resist octavinylsilsesquioxan and its application to three-dimensional electron-beam lithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Software tool for temperature simulation in electron-beam lithography: TEMPTATION
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Advanced model for resist heating effect simulation in electron-beam lithography
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Optical lithography simulation and photoresist optimization for photomask fabrication
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Dry resist technology to fabricate optimized microlenses centered to the end of a monomode fiber with electron-beam lithography
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |