Inspection and repair of EUV
- Author(s):
- Fisch,E. ( IBM Microelectronics Div. )
- Kindt,L.
- Lercel,M.J.
- Schmidt,M.R.
- Publication title:
- 21st Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4562
- Pub. Year:
- 2001
- Vol.:
- 4562
- Pt.:
- One of Two Parts
- Page(from):
- 480
- Page(to):
- 485
- Pages:
- 6
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819442901 [0819442909]
- Language:
- English
- Call no.:
- P63600/4562
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
Evaluation and comparison of the pattern transfer-induced image placement distortions on e-beam projection lithography masks
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Status of fabrication of square-format masks for extreme-ultraviolet lithography (EUVL) at the MCoC
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Process for improved reflectivity uniformity in extreme-ultraviolet lithography (EUVL) masks
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |