2001 update on the SEMI Standards Mask Qualification Terminology Task Force

2001 update on the SEMI Standards Mask Qualification Terminology Task Force

Author(s):: Jonckheere,R.M. ( IMEC )
Publication title:: 21st Annual BACUS Symposium on Photomask Technology
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 4562
Pub. Year:: 2001
Vol.:: 4562
Pt.:: One of Two Parts
Page(from):: 264
Page(to):: 271
Pages:: 8
Pub. info.:: Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819442901 [0819442909]
Language:: English
Call no.:: P63600/4562
Type:: Conference Proceedings

Details

TDL ID:	ZA00012276
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2001 : 21st
Conf. info. (Venue):	Monterey, CA, USA
Conf. info. (Date):	2001.10.03-2001.10.05

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