Multibeam high-resolution die-to-database reticle inspection
- Author(s):
Volk,W.W. ( KLA-Tencor Corp. ) Broadbent,W.H. Garcia,H.I. Watson,S.G. Lim,P.M. Ruch,W.E. - Publication title:
- 21st Annual BACUS Symposium on Photomask Technology
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4562
- Pub. Year:
- 2001
- Vol.:
- 4562
- Pt.:
- One of Two Parts
- Page(from):
- 111
- Page(to):
- 121
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819442901 [0819442909]
- Language:
- English
- Call no.:
- P63600/4562
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Energy flux method for die-to-database inspection of critical layer reticles
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Extending TeraStar reticle inspection capability to the 90nm node through layer-specific algorithms
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
New die-to-database inspection algorithm for inspection of 90-nm node reticles
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |