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Tool and process optimization for 100-nm maskmsking using a 50-Vk variale shaped e-beam system

Author(s):
Beyer,D. ( Leica Microsystems Lithography GmbH )
Loffelmacher,D.
Goedl,G.
Hudek,P.
Schnabel,B.
Elster,T.
1 more
Publication title:
21st Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4562
Pub. Year:
2001
Vol.:
4562
Pt.:
One of Two Parts
Page(from):
88
Page(to):
98
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819442901 [0819442909]
Language:
English
Call no.:
P63600/4562
Type:
Conference Proceedings

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