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Compact high-power laser-plasma x-ray source for lithography

Author(s):
Gaeta,C.J. ( JMAR Technologies, Inc. )
Rieger,H.
Turcu,I.C.E.
Forber,R.A.
Campeau,S.M.
Cassidy,K.L.
Powers,M.F.
Grygier,R.K.
Maldonado,J.R.
French,G.
Naungayan,J.R.
Kelsy,C.
Hark,P.
Morris,J.H.
Foster,R.M.
10 more
Publication title:
Advances in laboratory-based X-ray sources and optics II : 30 July-1 August 2001, San Diego, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4502
Pub. Year:
2001
Page(from):
82
Page(to):
95
Pages:
14
Pub. info.:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819442161 [081944216X]
Language:
English
Call no.:
P63600/4502
Type:
Conference Proceedings

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