Optical inspection of EUV and SCALPEL reticles
- Author(s):
- Pettibone,D.W. ( KLA-Tencor Corp. )
- Stokowski,S.E.
- Publication title:
- Photomask and Next-Generation Lithography Mask Technology VIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4409
- Pub. Year:
- 2001
- Page(from):
- 710
- Page(to):
- 717
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819441119 [0819441112]
- Language:
- English
- Call no.:
- P63600/4409
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
TRANSITION-METAL IONS IN Nd-DOPED GLASSES: SPECTRA AND EFFECTS ON Nd FLOURESCENCE
Materials Research Society |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Wafer printability simulation accuracy based on UV optical inspection images of reticle defects
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
Inspection of alternating phase-shift masks through the use of phase contrast techniques
SPIE-The International Society for Optical Engineering |