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Advanced FIB mask repair technology for ArF lithography: ？

Author(s):
Hagiwara,R. ( Seiko Instruments, Inc. )
Yasaka,A.
Takaoka,O.
Kozakai,T.
Yabe,S.
Koyama,Y.
Muramatsu,M.
Doi,T.
Suzuki,K.
Okabe,M.
Aita,K.
Adachi,T.
Kubo,S.
Yoshioka,N.
Morimoto,H.
Morikawa,Y.
Iwase,K.
Hayashi,N.
13 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology VIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4409
Pub. Year:
2001
Page(from):
555
Page(to):
562
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819441119 [0819441112]
Language:
English
Call no.:
P63600/4409
Type:
Conference Proceedings

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