Blank Cover Image

Photomask quality control by Virtual Stepper system for subwavelength photomasks

Author(s):
Publication title:
Photomask and Next-Generation Lithography Mask Technology VIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4409
Pub. Year:
2001
Page(from):
512
Page(to):
517
Pages:
6
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819441119 [0819441112]
Language:
English
Call no.:
P63600/4409
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Subwavelength lithography: an impact of photomask errors on cricuit performance

Karklin, L., Mazor, S., Joshi, D., Balasinski, A., Axelrad, V.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Mask manufacturability issues for subwavelength lithography

Karklin, L., Rachlin, K. E.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Mask quality(control)evaluation using the Virtual Stepper System(VSS)

Karklin,L., Weed,J.T., Li,J.

SPIE - The International Society for Optical Engineering
8 Conference Proceedings Impact of subwavelength CD tolerance of device performance

Balasinski, A., Karklin, L., Axelrad, V.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings New generation photomasks: 193-nm defect printability study

Karklin,L., Adrichem,P.van, Driessen,F., Mazor,S.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Simulation-based photomask qualification using i-Virtual Stepper [5992-44]

Taylor, D., Morgan, R., Hu, S.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Comprehensive simulation study of the photomask defects printability

Karklin,L.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Propagation of resist heating mask error to wafer level [6349-193]

Babin, S. V., Karklin, L.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings Comparison of binary mask defect printability analysis using virtual stepper system and aerial image microscope system

Phan,K.A., Spence,C.A., Dakshina-Murthy,S., Bala,V., Williams,A.M., Strener,S., Eandi,R.D., Li,J., Karklin,L.

SPIE - The International Society for Optical Engineering
11 Conference Proceedings Detection and printability of random and programmed pinholes on Cr photomasks

Kalk,F.D., Vacca,A., Howard,C., Karklin,L.

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Lithographic analysis of distributed photomask defects: II. Random mask CD errors

Karklin, L.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Defect printability analysis study using virtual stepper system in a production environment

Chiou, S.Y., Lei, H., Liu, W.J., Chu, M.J., Chiang, D., Tuan, S., Hong, C.-L., Chang, M., Chen, J.-H., Chan, K.K., Qian, …

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12