Effect of clear field ratio on critical dimension in the dry etching process
- Author(s):
Lee,C.-J. ( DuPont Photomasks Korea Ltd. ) Bang,H.-S. Choi,J.-W. Jung,H.-S. Shin,C. Kim,H.-S. - Publication title:
- Photomask and Next-Generation Lithography Mask Technology VIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4409
- Pub. Year:
- 2001
- Page(from):
- 396
- Page(to):
- 400
- Pages:
- 5
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819441119 [0819441112]
- Language:
- English
- Call no.:
- P63600/4409
- Type:
- Conference Proceedings
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