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Writing accuracy of EBM-3500 electron-beam mask writing system

Author(s):
Ohtoshi,K. ( Toshiba Machine Co., Ltd. )
Sunaoshi,H.
Takamatsu,J.
Okabe,F.
Ishibashi,K.
Yoshitake,S.
Yamada,H.
Tamamushi,S.
Anze,H.
Kamikobo,T.
Ogawa,Y.
6 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology VIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4409
Pub. Year:
2001
Page(from):
238
Page(to):
247
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819441119 [0819441112]
Language:
English
Call no.:
P63600/4409
Type:
Conference Proceedings

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