New mask technology challenges
- Author(s):
- Kimmel,K.R. ( International SEMATECH )
- Publication title:
- Photomask and Next-Generation Lithography Mask Technology VIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4409
- Pub. Year:
- 2001
- Page(from):
- 1
- Page(to):
- 11
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819441119 [0819441112]
- Language:
- English
- Call no.:
- P63600/4409
- Type:
- Conference Proceedings
Similar Items:
SPIE-The International Society for Optical Engineering |
7
Conference Proceedings
X-ray mask image-placement studies at the Microlithography Mask Development Center
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
Assessment of silicon carbide x-ray mask overlay performance in the IBM Advanced Lithography Facility x-ray stepper
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Inspection of alternating phase-shift masks through the use of phase contrast techniques
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
Conference Proceedings
Alternating phase-shift mask inspection through the use of phase contrast enhancement techniques
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
X-ray mask fabrication advancements at the Microlithographic Mask Development Center
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
6
Conference Proceedings
Current status of x-ray mask manufacturing at the Microlithographic Mask Development Center
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |