Control of organic contamination in CMOS manufacturing

Control of organic contamination in CMOS manufacturing

Author(s):

Bugler,J. ( Fraunhofer Institute for Integrated Circuits )

Publication title:

In-line characterization, yield, reliability, and failure analysis in microelectronic manufacturing II : 31 May-1 June 2001, Edinburgh, UK

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4406

Pub. Year:

2001

Page(from):

82

Page(to):

91

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819441072 [0819441074]

Language:

English

Call no.:

P63600/4406

Type:

Conference Proceedings

Details

TDL ID:	ZA00012122
Series ID:	PA00000029
Conf. info. (Name):	Microelectronic Manufacturing Technologies : In-Line Characterization, Yield, Reliability, and Failure Analysis in Microelectronic Manufacturing
Conf. info. (Number):	2001 : 2nd
Conf. info. (Venue):	Edinburgh, UK
Conf. info. (Date):	2001.05.31-2001.06.01

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