Low-temperature 193-nm resist reflow process for 100-nm generation contact patterning
- Author(s):
- Driessche,V.Van ( Arch Chemicals N.V. )
- Lucas,K.
- Roey,F.Van
- Grozev,G.
- Tzviatkov,P.
- Publication title:
- Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4404
- Pub. Year:
- 2001
- Page(from):
- 396
- Page(to):
- 407
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819441058 [0819441058]
- Language:
- English
- Call no.:
- P63600/4404
- Type:
- Conference Proceedings
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