Automatic calibration of lithography simulation parameters
- Author(s):
- Jug,S. ( FINLE Technologies )
- Huang,R.
- Byers,J.D.
- Mack,C.A.
- Publication title:
- Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4404
- Pub. Year:
- 2001
- Page(from):
- 380
- Page(to):
- 395
- Pages:
- 16
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819441058 [0819441058]
- Language:
- English
- Call no.:
- P63600/4404
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Top-down versus cross-sectional SEM metrology and its impact on lithography simulation calibration
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Nonconstant diffusion coefficients: short description of modeling and comparison to experimental results
Society of Photo-optical Instrumentation Engineers |
4
Conference Proceedings
Calibration of ESCAP resist simulation parameters from consideration of printed CD pitch bias, CD measurement offset, and wafer thermal history
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Comparison between the process windows calculated with full and simplified resist models
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |