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Sub-0.35-μm i-line lithography with new advanced bottom antireflective coatings optimized for high-topography and dual-damascene applications

Author(s):
Publication title:
Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4404
Pub. Year:
2001
Page(from):
354
Page(to):
367
Pages:
14
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819441058 [0819441058]
Language:
English
Call no.:
P63600/4404
Type:
Conference Proceedings

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