Development and investigation of high-quality CaF2 used for 157-nm microlithography
- Author(s):
Engel,A. ( Schott Lithotec AG ) Knapp,K. Aschke,L. Morsen,E. Triebel,W. Chojetzki,C. Bruckner,S. - Publication title:
- Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4404
- Pub. Year:
- 2001
- Page(from):
- 298
- Page(to):
- 304
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819441058 [0819441058]
- Language:
- English
- Call no.:
- P63600/4404
- Type:
- Conference Proceedings
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