Photomask blanks quality and functionality improvement challenges for the 130-nm node and beyond

Photomask blanks quality and functionality improvement challenges for the 130-nm node and beyond

Author(s):

Kobayashi,H. ( HOYA Corp. )
Ushida,M.
Ueno,K.

Publication title:

17th European Conference on Mask Technology for Integrated Circuits and Microcomponents

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4349

Pub. Year:

2000

Page(from):

164

Page(to):

169

Pages:

6

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440396 [0819440396]

Language:

English

Call no.:

P63600/4349

Type:

Conference Proceedings

Details

TDL ID:	ZA00012065
Series ID:	PA00000029
Conf. info. (Name):	European Mask and Lithography Conference : European Conference on Mask Technology for Integrated Circuits and Microcomponents
Conf. info. (Number):	2000 : 17th
Conf. info. (Venue):	Munich, Germany
Conf. info. (Date):	2000.11.13-2000.11.14

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