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Quality assessment of advanced photomasks using the Q-CAP cluster tool

Author(s):
Peter,K. ( aiss GmbH )
Schatz,T.
Ordynskyy,V.
Liebe,R.
Verbeek,M.
Galan,G.
Baracchi,E.
Miramond,C.
Bruck,H.-J.
Scheuring,G.
Engel,T.
Eran,Y.
Sommer,K.
Hartmann,H.
9 more
Publication title:
17th European Conference on Mask Technology for Integrated Circuits and Microcomponents
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4349
Pub. Year:
2000
Page(from):
117
Page(to):
124
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440396 [0819440396]
Language:
English
Call no.:
P63600/4349
Type:
Conference Proceedings

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