Doubly exposed patterning characteristics using two alternating phase-shift masks
- Author(s):
Lee,S.-W. ( Samsung Electronics Co., Ltd. ) Shin,I.-G. Kim,Y.-H. Choi,S.-W. Han,W.-S. Yoon,H.-S. Sohn,J.-M. - Publication title:
- 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4349
- Pub. Year:
- 2000
- Page(from):
- 32
- Page(to):
- 36
- Pages:
- 5
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440396 [0819440396]
- Language:
- English
- Call no.:
- P63600/4349
- Type:
- Conference Proceedings
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