Resistless electron beam lithography technique for the fabrlcation of x-ray masks
- Author(s):
- Lavallee,E. ( Quantiscript Inc./Univ. de Sherbrooke )
- Drouin,D.
- Beauvais,J.
- Publication title:
- 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4349
- Pub. Year:
- 2000
- Page(from):
- 10
- Page(to):
- 12
- Pages:
- 3
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440396 [0819440396]
- Language:
- English
- Call no.:
- P63600/4349
- Type:
- Conference Proceedings
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