Experimental model verification of the thermal response of optical reticles

Experimental model verification of the thermal response of optical reticles

Author(s):

Abdo,A.Y. ( Univ. of Wisconsin/Madison )

Publication title:

Optical Microlithography XIV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4346

Pub. Year:

2001

Vol.:

4346

Pt.:

Two of Two Parts

Page(from):

1478

Page(to):

1483

Pages:

6

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440327 [0819440329]

Language:

English

Call no.:

P63600/4346

Type:

Conference Proceedings

Details

TDL ID:	ZA00012062
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2001 : 14th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2001.02.27-2001.03.02

Similar Items:

1 Conference Proceedings Equivalent modeling technique for predicting the transient thermomechanical response of optical reticles during exposure Abdo, A.Y., Engelstad, R.L., Beckman, W.A., Lovell, E.G., Mitchell, J.W. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Thermomechanical distortions of ion-beam stencil masks during exposure Lee,P.-T., Kim,B., Frisque,G.A., Tejeda,R.O., Engelstad,R.L., Lovell,E.G., Beckman,W.A., Mitchell,J.W. SPIE - The International Society for Optical Engineering
2 Conference Proceedings Predicting thermomechanical distortions of optical reticles for 157-nm technology Abdo,A.Y., Engelstad,R.L., Beckman,W.A., Mitchell,J.W., Lovell,E.G. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Mechanical analysis of hard pellicles for 157-nm lithography Reu,P.L., Mikkelson,A.R., Schlax,M.P., Cotte,E.P., Siewert,L.K., Engelstad,R.L., Lovell,E.G., Dao,G.T., Zheng,J.-F. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Thermomechanical distortions of advanced optical reticles during exposure Chang,J., Abdo,A., Kim,B., Bloomstein,T.M., Engelstad,R.L., Lovell,E.G., Beckman,W.A., Mitchell,J.W. SPIE - The International Society for Optical Engineering	9 Conference Proceedings Optimization of EUVL reticle thickness for image placement accuracy Zheng, L., Mikkelson, A.R., Abdo, A.Y., Engelstad, R.L., Lovell, E.G., White, T.J. SPIE - The International Society of Optical Engineering
4 Conference Proceedings Thermomechanical modeling of the pin-chucked EUV reticle during exposure Wei, A.C., Martin, C.J., Beckman, W.A., Mitchell, J.W., Engelstad, R.L., Lovell, E.G., Blaedel, K.L. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Dynamic characterization of step-induced vibrations of x-ray mask membranes Schlax,M.P., Engelstad,R.L., Lovell,E.G. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Modal analysis of the SCALPEL mask using experimental and numerical methods Semke,W.H., Schlax,M.P., Engelstad,R.L., Lovell,E.G., Liddle,J.A. SPIE - The International Society for Optical Engineering	11 Conference Proceedings Stress mapping techniques for the SCALPEL mask membrane system Schlax,M.P., Engelstad,R.L., Lovell,E.G., Liddle,J.A., Novembre,A.E. SPIE - The International Society for Optical Engineering
6 Conference Proceedings Mask-related distortions of modified fused silica reticles for 157-nm lithography Mikkelson,A.R., Abdo,A.Y., Cotte,E.P., Sohn,J., Engelstad,R.L., Lovell,E.G. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Finite element modeling of SCALPEL masks Engelstad,R.L., Lovell,E.G., Dicks,G.A., Martin,C.J., Schlax,M.P., Semke,W.H., Liddle,J.A., Novembre,A.E. SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12