Next-generation 193-nm laser for sub-100-nm lithography

Next-generation 193-nm laser for sub-100-nm lithography

Author(s):

Duffey,T.P. ( Cymer, Inc. )

Publication title:

Optical Microlithography XIV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4346

Pub. Year:

2001

Vol.:

4346

Pt.:

Two of Two Parts

Page(from):

1202

Page(to):

1209

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440327 [0819440329]

Language:

English

Call no.:

P63600/4346

Type:

Conference Proceedings

Details

TDL ID:	ZA00012062
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2001 : 14th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2001.02.27-2001.03.02

Similar Items:

1 Conference Proceedings Production-ready 4-kHz ArF laser for 193-nm lithography Oh, P.C., Fleurov, V.B., Hofmann, T., Duffey, T.P., Trintchouk, F., O'Keeffe, P., Newman, P.C., Blumenstock, G.M. SPIE-The International Society for Optical Engineering	7 Conference Proceedings ArF lasers for production of semiconductor devices with CD <0.15 ｦﾌm Duffey,T.P., Embree,T.J., Ishihara,T., Morton,R.G., Partlo,W.N., Watson,T.A., Sandstrom,R.L. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Comparison of ArF and KrF laser performance at 2 kHz for microlithography Besaucele,H., Das,P.P., Duffey,T.P., Embree,T.J., Ershov,A.I., Fleurov,V.B., Grove,S.L., Melcher,P.C., Ness,R., … SPIE - The International Society for Optical Engineering	8 Conference Proceedings Controlled contamination studies in 193-nm immersion lithography Newman, G., Sun, H. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Dual-chamber ultra line-narrowed excimer light source for 193-nm lithography Fleurov, V.B., III, D.J.C., Brown, D.J.W., O'Keeffe, P., Besaucele, H., Ershov, A.I., Trintchouk, F., Ishihara, T., … SPIE-The International Society for Optical Engineering	9 Conference Proceedings Second generation fluids for 193 nm immersion lithography Yu, S.-S., Lin, B. J. SPIE - The International Society of Optical Engineering
4 Conference Proceedings Characterization of next-generation bake plate requirements for 193-nm lithography tools Do, P.T., Kang, A., Pender, J., Lehmann, T., McArdle, L., Quli, F., Pascale, J. SPIE - The International Society of Optical Engineering	10 Conference Proceedings How to print 100-nm contact hole with low-NA 193-nm lithography Lin, S.-, Teng, J.-, Chen, J.-, Chen, C.-, Ho, B.- SPIE - The International Society of Optical Engineering
5 Conference Proceedings Impact of surfactant in developer and rinse solution on 193-nm lithography performance Zhang, P., Jaramillo, M. Jr.,, King, D.M., Ross, B., Witko, D., Paxton, T.A., Davis, T. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Modeling chemically amplified resists for 193-nm lithography Croffie,E.H., Cheng,M., Neureuther,A.R., Houlihan,F.M., Cirelli,R.A., Sweeney,J.R., Dabbagh,G., Watson,G.P., … SPIE - The International Society for Optical Engineering
6 Conference Proceedings Next-generation scanner to sub-100-nm lithography Fujita, I., Sakai, F.M., Uzawa, S. SPIE-The International Society for Optical Engineering	12 Conference Proceedings ArF negative resist system using androsterone structure with δ-hydroxy acid for 100-nm phase-shifting lithography Yokoyama,Y., Hattori,T., Kimura,K., Tanaka,T.P., Shiraishi,H. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12