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Mechanical analysis of hard pellicles for 157-nm lithography

Author(s):
Reu,P.L. ( Univ. of Wisconsin/Madison )
Mikkelson,A.R.
Schlax,M.P.
Cotte,E.P.
Siewert,L.K.
Engelstad,R.L.
Lovell,E.G.
Dao,G.T.
Zheng,J.-F.
4 more
Publication title:
Optical Microlithography XIV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4346
Pub. Year:
2001
Vol.:
4346
Pt.:
Two of Two Parts
Page(from):
1166
Page(to):
1174
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819440327 [0819440329]
Language:
English
Call no.:
P63600/4346
Type:
Conference Proceedings

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