Long pulse duration of F2 laser for 157-nm lithography

Long pulse duration of F2 laser for 157-nm lithography

Author(s):

Watanabe,H. ( Association of Super-Advanced Electronics Technologies )

Publication title:

Optical Microlithography XIV

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4346

Pub. Year:

2001

Vol.:

4346

Pt.:

Two of Two Parts

Page(from):

1074

Page(to):

1079

Pages:

6

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819440327 [0819440329]

Language:

English

Call no.:

P63600/4346

Type:

Conference Proceedings

Details

TDL ID:	ZA00012062
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical microlithography
Conf. info. (Number):	2001 : 14th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2001.02.27-2001.03.02

Similar Items:

1 Conference Proceedings Ultrahigh-repetition-rate ArF excimer laser with long pulse duration for 193-nm lithography Kakizaki,K., Matsunaga,T., Sasaki,Y., Inoue,T., Tanaka,S., Tada,A., Taniguchi,H., Arai,M., Igarashi,T. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Spectral metrologies for ultra-line-narrowed F2 laser Nakaike, T., Wakabayashi, O., Suzuki, T., Mizoguchi, H., Nakao, K., Nohdomi, R., Ariga, T., Kitatochi, N., Suganuma, T., … SPIE-The International Society for Optical Engineering
2 Conference Proceedings Spectral measurement of ultra line-narrowed F2 laser Wakabayashi,O., Sakuma,J., Suzuki,T., Kubo,H., Kitatochi,N., Suganuma,T., Nakaike,T., Kumazaki,T., Hotta,K., … SPIE-The International Society for Optical Engineering	8 Conference Proceedings Beam quality of a new-type MOPO laser system for VUV laser lithography Wakabayashi, O., Ariga, T., Kumazaki, T., Sasano, K., Watanabe, T., Yabu, T., Hori, T., Kakizaki, K., Sumitani, A., … SPIE - The International Society of Optical Engineering
3 Conference Proceedings Ultra-line-narrowed F2 laser for microlithography Komori,H., Ariga,T., Watanabe,H., Kumazaki,T., Kitatochi,N., Sasano,K., Ueno,Y., Nishisaka,T., Nohdomi,R., Hotta,K., … SPIE-The International Society for Optical Engineering	9 Conference Proceedings Advanced F2 lasers for 157-nm lithography Vogler,K., Klaft,I., Voss,F., Bragin,I., Bergmann,E., Nagy,T., Niemoeller,N., Paetzel,R., Govorkov,S.V., Hua,G. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Challenge of the F2 laser for dioptric projection system Ariga,T., Watanabe,H., Kumazaki,T., Kitatochi,N., Sasano,K., Ueno,Y., Nishisaka,T., Nohdomi,R., Hotta,K., Mizoguchi,H., … SPIE-The International Society for Optical Engineering	10 Conference Proceedings Environmental control for lithography with 157-nm exposure Kitano, J., Kiba, Y., Inazawa, K., Miyoshi, S., Watanabe, H., Furukawa, T., Itani, T. SPIE-The International Society for Optical Engineering
5 Conference Proceedings High-repetition-rate ArF excimer laser for 193-nm lithography Kakizaki,K., Saito,T., Mitsuhashi,K., Arai,M., Tada,A., Kasahara,S., Igarashi,T., Hotta,K. SPIE - The International Society for Optical Engineering	11 Conference Proceedings Feasibility study of 6 kHz ArF excimer laser for 193 nm immersion lithography Hori, T., Yabu, T., Ishihara, T., Watanabe, T., Wakabayashi, O., Sumitani, A., Kakizaki, K., Mizoguchi, H. SPIE - The International Society of Optical Engineering
6 Conference Proceedings Development of a 5-kHz ultra-line-narrowed F2 laser for dioptric projection systems Ariga, T., Watanabe, H., Kumazaki, T., Kitatochi, N., Sasano, K., Ueno, Y., Konishi, M., Suganuma, T., Nakano, M., … SPIE-The International Society for Optical Engineering	12 Conference Proceedings Fluoropolymer resists for 157-nm lithography Toriumi, M., Shida, N., Watanabe, H., Yamazaki, T., Ishikawa, S., Itani, T. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12